Questions were basically from my PhD thesis: graphene devices . lithographic fabrication + etching + plasma generation 1.Describe about your research. What kind of photoresist was used? How does dry etching (RIE etch) works.. the setup. Any proble m during research and approach to solve. etcs.
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Cp, Cpk, gauge r&r, DOE, and in details about one of your projects.
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