Process Development Engineer Interview Questions

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Questions were basically from my PhD thesis: graphene devices . lithographic fabrication + etching + plasma generation 1.Describe about your research. What kind of photoresist was used? How does dry etching (RIE etch) works.. the setup. Any proble m during research and approach to solve. etcs.
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D1DR Process Engineering

Interviewed at Intel Corporation

3.9
Jul 28, 2013

Questions were basically from my PhD thesis: graphene devices . lithographic fabrication + etching + plasma generation 1.Describe about your research. What kind of photoresist was used? How does dry etching (RIE etch) works.. the setup. Any proble m during research and approach to solve. etcs.

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