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NF3 has a high global warming potential, but smart optimizations can make a difference. By working with STMicroelectronics, we achieved a 32% reduction in CO2e emissions through optimized chamber cleaning — a step toward a more sustainable future. Learn more.
For the third year in a row, we’re joining the 136 companies named one of the World's Most Ethical Companies® by Ethisphere. This recognition honors our commitment to advancing business integrity through ethics and compliance, governance, culture, environmental and social impact, and more.
Can Dual Work-Function Metal Gate (DWMG) structure in DRAM buried word-lines mitigate gate-induced drain leakage? Dive into our latest blog post to see how we leveraged SEMulator3D® to show how this approach reduces leakage current while maintaining device performance.
Built on the legacy of our Kiyo® solution, Akara® represents the next generation of our conductor etch innovation and leadership. Read the blog to learn everything about this breakthrough.
We unveiled the industry's most advanced conductor etch solution to date — Akara®. Akara® helps chipmakers overcome the toughest scaling challenges associated with complex 3D architectures. Learn how our technology leverages new proprietary etch solutions to tackle these issues.
The future of NAND, DRAM, and logic devices depends on advanced deposition tools like our newest solution ALTUS® Halo — the world’s first atomic layer deposition (ALD) tool leveraging the metal molybdenum. Learn how we help customers produce the next generation of cutting-edge semiconductor chips.
Shrinking transistors to the angstrom scale presents major patterning challenges. Our Aether® dry resist technology, used with EUV (extreme ultraviolet) lithography, overcomes these hurdles, enabling higher resolution and optimized yields for next-gen semiconductors.
Fortune named us one of the World’s Most Admired Companies for 2025! This recognition is a testament to our ongoing dedication to excellence, innovation, and collaboration. See how we earned a spot on the list.
Introduced in 2020, Aether® is key to the production of next-generation semiconductor devices. Learn how we partner with industry leaders to deliver precise, low-defect DRAM patterning innovations at scale via the release.
Once again, we landed on the Dow Jones Sustainability Index for North America! This continued recognition highlights our leadership in sustainability and reflects how we’re integrating sustainability principles in our policies, processes, and products. As part of our dedication to sustainability, we also joined Climate Group’s RE100. Explore how we prioritize sustainability at Lam.
